A research team has developed a new thin film deposition process for tin selenide-based materials. This process utilizes the metal-organic chemical vapor deposition (MOCVD) method, enabling thin film ...

A new way to deposit thin layers of atoms as a coating onto a substrate material at near room temperatures has been invented at The University of Alabama in Huntsville (UAH), a part of the University ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

Researchers from ten countries assessed the prospects of using vapor-based deposition processes to put perovskite thin film processing on the fast track to commercialization, drawing attention to its ...

The German research institute is investigating the use of commercially available vacuum-based evaporation equipment to manufacture perovskite thin films and contacts layers in the fabrication of ...

Making films one molecular layer at a time might seem like painstaking work limited to laboratories researching esoteric surface science. But it’s not. Atomic layer deposition (ALD), a layer-at-a-time ...

Chemical vapor deposition (CVD) is a process widely used in the manufacturing of electronic and energy devices as it is able to form conducting, semiconducting and dielectric thin films. Here, in the ...

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A technical paper titled “Quantified Uniformity and Selectivity of TiO 2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles” was published by researchers at IMEC, North ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...