Nanoscale lithographic technologies have been intensively studied for the development of the next generation of semiconductor manufacturing practices. While mask-less/direct-write electron beam (EB) ...
When it comes to extremely fine, precise features, a scanning electron microscope (SEM) is unrivaled. A focused electron beam can directly deposit complex features onto a substrate in a single step ...
Researchers have demonstrated a new process for rapidly fabricating complex three-dimensional nanostructures from a variety of materials, including metals. The new technique uses nanoelectrospray to ...
Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography
Direct-write patterning of biomolecules at micrometre and nanometre length scales has the potential to enable pattern generation with fewer fabrication steps. In addition, direct-write approaches ...
(Nanowerk News) When it comes to extremely fine, precise features, a scanning electron microscope (SEM) is unrivaled. A focused electron beam can directly deposit complex features onto a substrate in ...
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