Nowadays, to have the edge over competitors, modern manufacturing automation systems have to be employed. They consist of Information Technology (IT) and control systems at business and process levels ...
Figure 1. A model INL 8 layer metal network assembled from M1, M2, and M4 layers from a 32nm CMOS logic circuit. The INL is fabricated on a Si substrate by 32nm capable BEOL tool sets. The total ...
NOTTINGHAM, England--(BUSINESS WIRE)--A UK collaboration between Nottingham-based start-up, Search For The Next (SFN) and Glenrothes-based Semefab may be set to disrupt the semiconductor industry by ...
A new approach combining atomic layer deposition and organic film etch process may solve critical challenges in the various processes in advanced nodes. We demonstrated a high selective and ...
CAMPBELL, Calif.–Silicon Genesis Corp. today announced an expansion of its silicon-on-insulator wafer production technology to deliver SOI substrates with a greater range silicon-thickness layers for ...
A pathway for ALD-enhanced materials to be quickly developed and transitioned from lab-scale to commercial production is available for almost any application, for the first time ever. Atomic-level ...
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